[PDF.83kx] Feature Profile Evolution in Plasma Processing Using On-wafer Monitoring System (SpringerBriefs in Applied Sciences and Technology)

Feature Profile Evolution in Plasma Processing Using On-wafer Monitoring System (SpringerBriefs in Applied Sciences and Technology)

[PDF.ex58] Feature Profile Evolution in Plasma Processing Using On-wafer Monitoring System (SpringerBriefs in Applied Sciences and Technology)

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 | #10425624 in Books |  2014-01-28 |  2014-02-28 | Original language:English | PDF # 1 |  9.25 x.13 x6.10l,.20 | File type: PDF | 40 pages

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||About the Author|Prof. Seiji Samukawa |Distinguished Professor in Tohoku University |Professor in Institute of Fluid Science, |Professor and Principal Investigator, WPI-AIMR in Tohoku University.

This book provides for the first time a good understanding of the etching profile technologies that do not disturb the plasma. Three types of sensors are introduced: on-wafer UV sensors, on-wafer charge-up sensors and on-wafer sheath-shape sensors in the plasma processing and prediction system of real etching profiles based on monitoring data. Readers are made familiar with these sensors, which can measure real plasma process surface conditions such as defect generati...

You can specify the type of files you want, for your device.Feature Profile Evolution in Plasma Processing Using On-wafer Monitoring System (SpringerBriefs in Applied Sciences and Technology)   |  Seiji Samukawa. Which are the reasons I like to read books. Great story by a great author.

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